Photolithographic projection systems including grating masks and

Details Photolithographic projection systems including grating masks and Photolithographic projection systems including grating masks and

1996-06-24

1998-03-10

Moses, R. L.

Photocopying

Projection printing and copying cameras

Illumination systems or details

355 53, 359227, 359232, G02B 2744, G03B 2742

Patent

active

057267413

ABSTRACT:
A photolithographic projection system for transferring a predetermined pattern from a photomask to a wafer includes a radiation source and a grating mask. The radiation source projects radiation along a path through the photomask toward the wafer. The grating mask is positioned along the radiation path and is separate from the photomask. In a method for transferring a predetermined pattern from a photomask to a wafer, radiation is projected along a path through a grating mask and a photomask toward the wafer, and the grating mask is separate from the photomask.

REFERENCES:
patent: 5348837 (1994-09-01), Fukuda et al.
patent: 5357311 (1994-10-01), Shiraishi
patent: 5446587 (1995-08-01), Kang et al.
patent: 5473410 (1995-12-01), Nishi
patent: 5552856 (1996-09-01), Shiraishi et al.

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