Photolithographic method using a two-layer photoresist and photo

Details Photolithographic method using a two-layer photoresist and photo Photolithographic method using a two-layer photoresist and photo

1984-12-20

1986-03-25

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430156, 430394, 430396, 430502, 430512, 430950, G03C 500

Patent

active

045783446

ABSTRACT:
A photobleachable layer has been found to improve the resolution limits of two-layer photoresists for making integrated circuits.

REFERENCES:
patent: 3925077 (1975-12-01), Lewis et al.
patent: 4225661 (1980-09-01), Muzyczko
patent: 4411978 (1983-10-01), Laridon et al.
patent: 4413051 (1983-11-01), Thomas
patent: 4464458 (1984-08-01), Chow et al.
West et al., Proceedings of the Society of Photo-Optical Instrumentation Engineers, No. 394 (1983), pp. 33-37.
Griffing et al., Polymer and Engineering and Science, vol. 23, (17), 1983, pp. 947-952.

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