Photolithographic method for the manufacture of integrated circu

Details Photolithographic method for the manufacture of integrated circu Photolithographic method for the manufacture of integrated circu

1980-10-06

1982-08-24

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430269, 430296, 430302, 430319, 430327, G03C 500

Patent

active

043461646

ABSTRACT:
In a photolithographic method for the manufacture of integrated circuits a mask having a pattern is imaged on a photosensitive layer coating a semiconductor substrate by a projection lens. To improve the resolving capability and to obviate adverse effects, e.g. standing waves and inhomogeneous exposure, the space between the substrate and the adjacent boundary face of a projection lens is filled during exposure with a transparent liquid having the same refractive index as the photosensitive layer.

REFERENCES:
patent: 3573975 (1971-04-01), Dhaka et al.

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