Photoirradiation thermal processing apparatus and thermal...

Details Photoirradiation thermal processing apparatus and thermal... Photoirradiation thermal processing apparatus and thermal...

2006-06-13

2006-06-13

Fuqua, Shawntina (Department: 3742)

Electric resistance heating devices

Heating devices

Radiant heater

C392S416000, C219S390000, C219S405000, C219S411000, C118S724000, C118S225000, C118S050100

Reexamination Certificate

active

07062161

ABSTRACT:
A susceptor is formed with a cavity having a tapered surface and a receiving surface. The gradient α of the tapered surface with respect to the receiving surface is set to at least 5° and less than 30°, so that a semiconductor wafer received by the susceptor can be located on the receiving surface through the tapered surface while the semiconductor wafer can be protected against excess stress also when the surface of the wafer abruptly thermally expands due to flashlight irradiation and can be prevented from cracking in thermal processing. Thus provided are a thermal processing susceptor and a thermal processing apparatus capable of preventing a substrate from cracking in thermal processing.

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Untranslated Korean Office Action issues Aug. 29, 2005 in Connection with corresponding Korean application No. 10-2003-0082856.
English statement of Examiner's assertion in Aug. 29, 2005 Korean Office Action of the relevancy of Korean Application No. 1999-84603 to application no. 10-2003-0082856.
English statement of Examiner's assertion in Aug. 29, 2005 Korean Office Action of the relevancy of Korean Application No. 2000-12370 to application No. 10-2003-0082856.

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