Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1992-01-06
1993-12-07
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430935, 2041817, 2041816, 522 91, 522 77, G03C 173
Patent
active
052682560
ABSTRACT:
An electrodepositable photoresist composition for producing non-tacky films on an electroconductive substrate comprises an aqueous dispersion of a water-dispersible photosensitive ionic polymeric material and a polyalkylene oxide-modified polysiloxane sufficient to give slip and blocking properties that enables direct placement of a photomask on the resultant dehydrated film. The composition also preferably contains a nonionic unsaturated material and a photoinitiator.
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Goetz Jonathan D.
Kahle, II Charles F.
Connell Gary J.
McCamish Marion E.
Millman Dennis G.
PPG Industries Inc.
Weiner Laura S.
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