Photoimageable, dielectric, crosslinkable copolyesters

Details Photoimageable, dielectric, crosslinkable copolyesters Photoimageable, dielectric, crosslinkable copolyesters

1996-03-01

1998-01-13

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

4302871, 4302861, 522104, 522105, 522107, 525450, 525442, G03F 7027

Patent

active

057077827

ABSTRACT:
Photosensitive, dielectric insulating, crosslinkable copolyester films used as dielectric and as photoresist films for microelectronics circuits which are also suitable for use in producing MCM-L packages. In various embodiments of the invention there is provided photosensitive, dielectric insulating, crosslinkable copolyester film forming mixtures for coating onto microelectronics substrate surfaces, a photosensitive oligomer for producing the crosslinkable copolyesters and MCM-L products produced using the crosslinked copolyesters.

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patent: 5439541 (1995-08-01), Economy
R. Rubner et al., Phot. Sci. & Eng. 23 (5), 303-309 (1979).
L. Schneggenburger & J. Economy, MCM Proceedings, 65 (1995).

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