Photoimageable compositions having improved chemical resistance

Details Photoimageable compositions having improved chemical resistance Photoimageable compositions having improved chemical resistance

1999-07-30

2000-04-25

Baxter, Janet

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

4302871, 525285, 522120, 522123, G03C 173, C08F26704, C08K 510

Patent

active

060542527

ABSTRACT:
A negative-acting photoimageable composition useful as a primary imaging resist in the manufacture of printed circuit boards comprises an acid-functional binder polymer, a photopolymerizable component, and a photoinitiator chemical system, in which the binder polymer has an anhydride functional backbone half-esterified with a meth(acrylate) functional hydroxy-terminated oligomer, wherein the meth(acrylate) functionality is separated from the half-ester linkage by at least two alkoxylate groups and at least one ring opened lactone group for improved stripping ability in strong alkaline aqueous stripping solutions, while maintaining good chemical resistance to other processing chemicals, such as alkaline developing solutions, acid etching solutions, and acid plating baths.

REFERENCES:
patent: 3448089 (1969-06-01), Cleleste
patent: 4537855 (1985-08-01), Ide
patent: 4963601 (1990-10-01), Shibato et al.

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