Photoimageable compositions having improved chemical resistance

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

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Details

4302871, 526271, G03C 1725, C08F 3402

Patent

active

060459735

ABSTRACT:
A negative-acting photoimageable composition useful as a primary imaging resist in the manufacture of printed circuit boards comprises an acid-functional binder polymer, a photopolymerizable component, and a photoinitiator chemical system, in which the binder polymer has an anhydride functional backbone half-esterified with a meth(acrylate) functional hydroxy-terminated oligomer, wherein the meth(acrylate) functionality is separated from the half-ester linkage by at least two alkoxylate groups and at least one ring opened lactone group for improved stripping ability in strong alkaline aqueous stripping solutions, while maintaining good chemical resistance to other processing chemicals, such as alkaline developing solutions, acid etching solutions, and acid plating baths.

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patent: 5114830 (1992-05-01), Surber
patent: 5115025 (1992-05-01), Koleske et al.
patent: 5296334 (1994-03-01), Castaldi et al.
patent: 5342891 (1994-08-01), Koleske et al.
patent: 5609991 (1997-03-01), Briguglio et al.

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