Photoimageable compositions containing substituted 1, 2 dihaloge

Details Photoimageable compositions containing substituted 1, 2 dihaloge Photoimageable compositions containing substituted 1, 2 dihaloge

1994-03-09

1995-04-18

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430281, 430338, 430340, 430344, 522 8, 522 9, 522 23, G03C 1725, G03F 7025

Patent

active

054077834

ABSTRACT:
Photoimageable compositions, photoimageable resist compositions, and photoimageable resist elements that afford enhanced, storage stable printout images are disclosed which include a substituted 1,2-dibromoethane and a leuco dye.

REFERENCES:
patent: 4168982 (1979-09-01), Pazos
patent: 4297435 (1981-10-01), Jolly et al.
patent: 4298678 (1981-11-01), McKeever
patent: 4552830 (1985-11-01), Reardon et al.
patent: 4634657 (1987-01-01), Holman
patent: 5030548 (1991-07-01), Fujikura et al.
patent: 5049480 (1991-09-01), Nebe et al.
patent: 5057398 (1991-10-01), Frommeld et al.

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