Photoimageable compositions comprising polyquinoline polymer and

Details Photoimageable compositions comprising polyquinoline polymer and Photoimageable compositions comprising polyquinoline polymer and

1997-04-28

1999-03-23

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430325, 430326, 430905, 430926, G03F 7004

Patent

active

058857451

ABSTRACT:
Photoimageable polyquinoline compositions comprise a polyquinoline polymer, a photogenerable acid precursor and optionally a photosensitizer. The composition is prepared by dissolving the polyquinoline polymer, photogenerable acid precursor and photosensitizer in a polar solvent to form a solution, coating the solution onto a substrate and thereafter removing the solvent to form a film. The film is exposed to light through a photo mask and developed by immersion in a selective solvent to yield a photopatterned dielectric film.

REFERENCES:
patent: 5306789 (1994-04-01), Hay et al.
patent: 5489623 (1996-02-01), Babb et al.
patent: 5585217 (1996-12-01), Oba
patent: 5605781 (1997-02-01), Gelorme et al.

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