Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1991-10-21
1993-07-20
Brammer, Jack P.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430281, 430288, 430916, 430927, 522101, 522104, 522170, G03C 173
Patent
active
052292525
ABSTRACT:
A photoimageable composition for forming a solder mask has a photopolymerizable acrylate chemical system which renders exposed portions insolvable to alkaline aqueous developers and an epoxy chemical system which hardens the composition after exposure and development. The acrylate chemical system comprises acrylate monomers, epoxy-acrylate oligomers and a photoinitiator. The epoxy chemical system comprises an epoxy resin and a curative therefore. The composition further comprises a cross-linking agent which is reactive with hydroxyl groups of the acrylate and epoxy chemical systems.
REFERENCES:
patent: 4481258 (1984-11-01), Sattler et al.
patent: 4786579 (1988-11-01), Tazawa et al.
patent: 4789620 (1988-12-01), Sasaki et al.
Flynn Kathy M.
Nelson Kathleen L.
Tara Vinai M.
Brammer Jack P.
Morton International Inc.
Nacker Wayne E.
White Gerald K.
LandOfFree
Photoimageable compositions does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photoimageable compositions, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photoimageable compositions will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1759637