Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2004-09-20
2008-11-11
Hamilton, Cynthia (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C522S140000, C430S325000, C430S330000
Reexamination Certificate
active
07449280
ABSTRACT:
A photoimagable composition suitable for use as a negative photoresist comprising:(A) at least one epoxidized polyfunctional bisphenol A formaldehyde novolak resin;(B) at least one polycaprolactone polyol reactive diluent, wherein the amount of component (A) is from about 95% to about 75% by weight of the sum of (A) and (B) and the amount of component (B) is from about 5% to about 25% by weight of the sum of (A) and (B);(C) at least one photoacid generator in an amount from about 2.5 to about 12.5 parts per hundred parts of resin and reactive diluent, which initiates polymerization upon exposure to actinic radiation; and(D) a sufficient amount of solvent to dissolve (A), (B) and (C);wherein the solvent comprises 2-pentanone, 3-pentanone, and 1,3-dioxolane and mixtures thereof.
REFERENCES:
patent: 3469982 (1969-09-01), Celeste
patent: 3708296 (1973-01-01), Schlesinger
patent: 3782939 (1974-01-01), Bonham et al.
patent: 4193797 (1980-03-01), Cohen et al.
patent: 4193799 (1980-03-01), Crivello
patent: 4247616 (1981-01-01), Vikesland et al.
patent: 4256828 (1981-03-01), Smith
patent: 4565859 (1986-01-01), Murai et al.
patent: 4576902 (1986-03-01), Saenger et al.
patent: 4624912 (1986-11-01), Zweifel et al.
patent: 4672020 (1987-06-01), Koelsch et al.
patent: 4841017 (1989-06-01), Murai et al.
patent: 4940651 (1990-07-01), Brown et al.
patent: 5026624 (1991-06-01), Day et al.
patent: 5043221 (1991-08-01), Koleske
patent: 5077174 (1991-12-01), Bauer et al.
patent: 5102772 (1992-04-01), Angelo et al.
patent: 5120633 (1992-06-01), Bauer et al.
patent: 5145764 (1992-09-01), Bauer et al.
patent: 5229252 (1993-07-01), Flynn et al.
patent: 5262281 (1993-11-01), Bauer et al.
patent: 5264325 (1993-11-01), Allen et al.
patent: 5278010 (1994-01-01), Day et al.
patent: 5304457 (1994-04-01), Day et al.
patent: 5335004 (1994-08-01), Matsuhisa
patent: 5405731 (1995-04-01), Chandrasekaran et al.
patent: 5494943 (1996-02-01), Mahoney et al.
patent: 5502083 (1996-03-01), Abe et al.
patent: 5665650 (1997-09-01), Lauffer et al.
patent: 5726216 (1998-03-01), Janke et al.
patent: 5859655 (1999-01-01), Gelorme et al.
patent: 5969736 (1999-10-01), Field et al.
patent: 6062681 (2000-05-01), Field et al.
patent: 6066889 (2000-05-01), Jones et al.
patent: 6096796 (2000-08-01), Watanabe et al.
patent: 6193359 (2001-02-01), Patil et al.
patent: 6204456 (2001-03-01), Lauffer et al.
patent: 6291140 (2001-09-01), Andreoli et al.
patent: 6305790 (2001-10-01), Kawamura et al.
patent: 6368769 (2002-04-01), Ohkawa et al.
patent: 6375313 (2002-04-01), Adavikolanu et al.
patent: 6391523 (2002-05-01), Hurditch et al.
patent: 6419346 (2002-07-01), Nikkel
patent: 6447102 (2002-09-01), Chen et al.
patent: 6462107 (2002-10-01), Sinclair et al.
patent: 6506989 (2003-01-01), Wang
patent: 6528218 (2003-03-01), Foster et al.
patent: 6544902 (2003-04-01), Farnworth
patent: 6576478 (2003-06-01), Wagner et al.
patent: 6582890 (2003-06-01), Dentinger et al.
patent: 6624730 (2003-09-01), Johnson et al.
patent: 6645432 (2003-11-01), Anderson et al.
patent: 6652878 (2003-11-01), Webb et al.
patent: 6663615 (2003-12-01), Madou et al.
patent: 6670129 (2003-12-01), Webb
patent: 6674350 (2004-01-01), Hirose et al.
patent: 6682942 (2004-01-01), Wagner et al.
patent: 6716568 (2004-04-01), Minsek et al.
patent: 2002/0076651 (2002-06-01), Hurditch et al.
patent: 2003/0059344 (2003-03-01), Brady et al.
Licari et al, Handbook of Polymer Coatings for Electronics, pp. 196-225, year 1990, Noyes Publications, Park Ridge, New Jersey, USA, from KNOVEL online database.
N. LaBianca and J.D. Gelorme, “High Aspect Ratio Resist for Thick Film Applications”, SPIE vol. 2438, pp. 846-852, Jun. 1995: Date of Publication.
J.V. Crivello and H.H.W. Lam, “Photoinitiated Cationic Polymerization with Trlarysulfonium Salts”,Journal of Polymer Science: Polymer Chemistry Edition, vol. 17, pp. 977-999, 1979.
Johnson Donald W.
Molea Joseph R.
Strand Thomas Roger
Urdi Vincent R.
Waterson Pamela J.
Garabedian Todd E.
Hamilton Cynthia
Hewlett-Packard Development Company LP
MicroChem Corp.
Wiggin and Dana LLP
LandOfFree
Photoimageable coating composition and composite article... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photoimageable coating composition and composite article..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photoimageable coating composition and composite article... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4048742