Photohardenable materials

Details Photohardenable materials Photohardenable materials

1982-06-10

1984-01-24

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430280, 430288, 430910, 430927, 20415914, 20415915, 20415916, G03C 168

Patent

active

044277601

ABSTRACT:
A photohardenable material is disclosed. The material is comprised of a copolymer (I') having ethylenically unsaturated bonds and having an acid value of about 5 to 180 and a molecular weight of about 1,500 to 100,000. The copolymer (I') is obtained by reacting carboxyl groups with a copolymer represented by the structural formula (I), as defined within the application. The material is further comprised of a copolymer (II) having a molecular weight of about 50,000 to 500,000. The copolymer (II) is comprised of three monomers whose structural formula is also defined within the application. The material is further comprised of a cross-linking agent having two or more ethylenically unsaturated bonds and a photoactivator. The copolymers (I') and (II) are present in a ratio of about 0.5 to 20.

REFERENCES:
patent: 3754054 (1973-08-01), Kimura et al.
patent: 4284707 (1981-08-01), Nagasawa et al.
J. D. Nordstrom and J. E. Hinsch, "Acrylic Copolymers for Radiation-Cured Coatings", Industrial and Engineering Chemistry, Product Research and Development, vol. 9, No. 2, 1970, pp. 155-158.

Affiliated with

Also associated with

Rating

Photohardenable materials does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photohardenable materials, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photohardenable materials will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1287799