Photographic system and photographic material for use therein

Details Photographic system and photographic material for use therein Photographic system and photographic material for use therein

1982-12-27

1984-07-03

Schilling, Richard L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making printing plates

430270, 430275, 430277, 430278, 430318, 430326, 430331, G03C 1495, G03C 172, G03F 710

Patent

active

044580088

ABSTRACT:
Photolithographic methods for the production for example of microelectronic circuits and sensitizing and printing elements in offset printing forms show marked improvement in sensitivity, non-critical outline development and good shelf-life as well as high resolving power and good adhesion of photosensitive coatings to a carrier base while remaining sensitive to exposure from a wide variety of radiation sources, by incorporating in or on a chalcogenide photosensitive layer, one or more materials selected from dyestuffs having the capacity for dyeing tannined cotton, dyestuffs having the capacity for dyeing synthetic fibres, compounds capable of acting as accelerators, antioxidants or age resistors in the vulcanization of elastomers and developing agents effective in the development of silver halide-based photographic materials. Many of the aforesaid advantages are also achieved if the dyestuff(s) is incorporated in an alkaline developing agent of the usual type.

REFERENCES:
patent: 3762325 (1973-10-01), Hallman et al.
patent: 4198237 (1980-04-01), Nahara et al.

Affiliated with

Also associated with

Rating

Photographic system and photographic material for use therein does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photographic system and photographic material for use therein, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photographic system and photographic material for use therein will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1630806