Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Simultaneous developing a resist image and etching a subtrate
Patent
1980-08-14
1981-09-29
Brammer, Jack P.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Simultaneous developing a resist image and etching a subtrate
430275, 430278, 430313, 430323, 430314, G03C 500
Patent
active
042923956
ABSTRACT:
A photosensitive image forming material comprising a tin sulfide image forming layer on a base and a photosensitive resin composition layer on said layer is disclosed. An image forming process using said material is also disclosed comprising imagewise exposing the same and then simultaneously developing the photosensitive resin composition layer and etching the exposed tin sulfide image forming layer. Alternatively, development and etching can be conducted as two separate steps.
REFERENCES:
patent: 3762325 (1973-10-01), Hallman et al.
patent: 4205989 (1980-06-01), Moriya et al.
Ikeda Tomoaki
Shinozaki Fumiaki
Takahashi Yohnosuke
Wada Minoru
Yoshida Satoshi
Brammer Jack P.
Fuji Photo Film Co. , Ltd.
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