Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Identified backing or protective layer containing
Patent
1977-10-18
1980-03-11
Brown, J. Travis
Radiation imagery chemistry: process, composition, or product th
Radiation sensitive product
Identified backing or protective layer containing
430636, 430935, G03C 176, G03C 102
Patent
active
041926838
ABSTRACT:
A photographic light-sensitive material comprising a layer which contains a compound represented by the following Formula I ##STR1## wherein R.sub.1 is an alkyl group having 1 to 18 carbon atoms, R.sub.2 is a hydrogen atom or an alkyl group having 1 to 18 carbon atoms with a proviso that when R.sub.2 is a hydrogen atom, R.sub.1 is an alkyl group having 1 to 7 carbon atoms, M is a cation and n is a number of 1 to 50.
REFERENCES:
patent: 2719087 (1955-09-01), Knox
patent: 3415649 (1968-12-01), Nishio et al.
patent: 3525620 (1970-08-01), Nishio et al.
patent: 3682641 (1972-08-01), Casler et al.
patent: 3788851 (1974-01-01), Willems et al.
patent: 3788852 (1974-01-01), Sels et al.
patent: 3860425 (1975-01-01), Ono et al.
patent: 3912517 (1975-10-01), Van Poucke et al.
Abe Naoto
Ishihara Masao
Kanbe Masaru
Kitahara Kenichi
Komiya Mamoru
Brown J. Travis
Konishiroku Photo Industry Co,., Ltd.
LandOfFree
Photographic light-sensitive material does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photographic light-sensitive material, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photographic light-sensitive material will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1999520