Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1987-08-20
1989-02-28
Brammer, Jack P.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430281, 430518, 522149, 522152, G03C 176
Patent
active
048085103
ABSTRACT:
A photographically negative-working patternable mordant composition is disclosed containing a photocrosslinkable polymer comprised of, for providing both mordanting and crosslinking sites, repeating units of the formula: ##STR1## wherein Ar is an aromatic linking group,
REFERENCES:
patent: 3709690 (1973-01-01), Cohen et al.
patent: 3898088 (1975-08-01), Cohen et al.
patent: 3958995 (1976-05-01), Campbell et al.
patent: 4315978 (1982-02-01), Hartman
patent: 4353972 (1982-10-01), Helling et al.
Herkstroeter et al., Journal of Photochemistry, vol. 35, pp. 71-85 (1986).
Turro, Modern Molecular Chemistry, p. 352 (1970).
Murov, Handbook of Photochemistry, pp. 1-7 and 27-35.
Sanada et al., "New Deep UV Dyeable Negative Resist for CCD Micro Color Filter", SPIE, vol. 631, Advances in Resist Technology and Processing III (1986), pp. 187-191.
Research Disclosure, vol. 151, Nov. 1976, Item 15162.
Toshiba Kokai 79246/1984, based on Japanese Application No. 189,081/1982, filed Oct. 29, 1982.
Daly Robert C.
Fischer Sandra K.
Hanrahan Michael J.
McGuckin Hugh G.
Pace Laurel J.
Brammer Jack P.
Eastman Kodak Company
Thomas Carl O.
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