Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Processing feature prior to imaging
Patent
1983-06-24
1986-05-13
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Processing feature prior to imaging
430 5, 430162, 430197, 430269, 430396, 430494, 430961, G03C 500, G03F 726, G03F 900
Patent
active
045886768
ABSTRACT:
A method for exposing a layer of photoresist on a sheet includes positioning the sheet in a vacuum printing frame comprising a glass plate carrying an opaque master pattern of metal or metal oxide. With the pattern opposite the coating, the frame is evacuated and the layer is exposed. The pattern has a substantially-uniform thickness in the range of about 0.5.+-.0.2 micrometer. To reduce the times for evacuating and devacuating the frame, the pattern side of the glass plate carries an array of light-transparent islands up to about 3.0-micrometer thick. An overcoating of wax on the islands is a further aid.
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Michielutti Thomas J.
Moscony John J.
Wetzel Charles M.
Bowers Jr. Charles L.
Coughlin Jr. Vincent J.
Irlbeck Dennis H.
RCA Corporation
Whitacre Eugene M.
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