Photodefinable interlevel dielectrics

Details Photodefinable interlevel dielectrics Photodefinable interlevel dielectrics

1988-06-24

1990-03-13

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

1566591, 156662, 156668, 156904, 427 431, 430313, 430286, B44C 122, B29C 3700, C03C 1500, C03C 2506

Patent

active

049080962

ABSTRACT:
Ethers of oligomeric phenol-dialdehyde condensation products containing vinyl benzyl moieties in at least half of the ether moieties are excellent photosensitive prepolymers. Through simple masking and irradiation with a broad range of radiation types, such a resin as a coating can be selectively patterned by dissolving the non-irradiated and non-photocrosslinked portions of the prepolymer with a large variety of common solvents. The outstanding differential solubility between the photocrosslinked and non-crosslinked regions of the prepolymer allows excellent resolution with good edge sharpness. Subsequent thermal curing affords a void-free infusible glassy solid with minimum shrinkage, excellent planarity characteristics, and high resistance to cracking.

REFERENCES:
patent: 4113550 (1978-09-01), Saiki et al.
patent: 4218283 (1980-08-01), Saiki et al.
patent: 4243743 (1981-01-01), Hiramoto et al.
patent: 4321319 (1982-03-01), Shoji et al.
patent: 4329419 (1982-05-01), Goff et al.
patent: 4353778 (1982-12-01), Fineman et al.
patent: 4386116 (1983-05-01), Nair et al.
patent: 4410612 (1983-10-01), Goff et al.
patent: 4414312 (1983-11-01), Goff et al.
patent: 4416973 (1983-11-01), Goff
patent: 4430418 (1984-02-01), Goff
patent: 4436583 (1984-03-01), Saiki et al.
patent: 4451551 (1984-05-01), Katsoka et al.
patent: 4454220 (1984-06-01), Goff
patent: 4508749 (1985-04-01), Branson et al.
patent: 4547455 (1985-10-01), Hiramoto
patent: 4565767 (1986-01-01), Katsoka et al.
patent: 4568601 (1986-02-01), Araps et al.
patent: 4608333 (1986-08-01), Ohbayashi et al.
patent: 4656050 (1987-04-01), Araps et al.
Stephen D. Senturia, Proceedings of the ACS Division of Polymer Materials: Science and Engineering, 55, 385,386 (1986).
Ronald J. Jensen, Idem., 55, 414,417 (1986).

Affiliated with

Also associated with

Rating

Photodefinable interlevel dielectrics does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photodefinable interlevel dielectrics, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photodefinable interlevel dielectrics will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-49514