Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1990-03-27
1992-02-25
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430288, 430918, 430286, G03F 7078
Patent
active
050912836
ABSTRACT:
A photo curable diallyl phthalate resin composition characterized by containing 0.1 to 10 parts by weight of an agent for preventing back side undesirable curing and 20 to 100 parts by weight of a filler per 100 parts by weight of a diallyl phthalate prepolymer is particularly suitable for a partly additive process for forming a solder resist effective for preventing back side undesirable curing by ultraviolet light and having resistance to release of substances from the solder resist for deteriorating properties of plated copper film as well as for giving good mechanical properties.
REFERENCES:
patent: 3726679 (1973-04-01), Abolafia et al.
patent: 3989618 (1976-11-01), Tsukada et al.
patent: 4247623 (1981-01-01), Guild
patent: 4268614 (1981-05-01), Ueyama et al.
patent: 4614778 (1986-09-01), Kajiura et al.
patent: 4943516 (1990-07-01), Kamayachi et al.
Imabayashi Shinichiro
Kikuchi Hiroshi
Oka Hitoshi
Tanaka Isamu
Taniguti Yukihiro
Hitachi , Ltd.
McCamish Marion E.
RoDee C. D.
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