Photocurable compositions

Details Photocurable compositions Photocurable compositions

1989-12-12

1991-10-29

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

522149, 525 59, G03F 7038, G03F 7028

Patent

active

050616030

ABSTRACT:
Photopolymerizable polyvinyl alcohols including a group of formula ##STR1## wherein R.sub.1 represents a substituted or unsubstituted alkyl group, a substituted or unsubstituted aralkyl group, or a hydrogen atom; R.sub.2 represents a substituted or unsubstituted alkyl group, a primary, secondary or tertiary amino group, a cyano, hydroxy or nitro group, a halogen or hydrogen atom or, together with the pyridine ring to which it is attached, part of a quinolyl group; R.sub.3 represents a chlorine or hydrogen atom or, together with the benzene ring to which it is attached, part of a naphthyl group; and X.sup.- represents an anion, and photocurable compositions for producing screen printing stencils including such polyvinyl alcohol derivatives. Compositions of the invention show high light sensitivity with low levels of photocrosslinkable groups grafted to the polyvinyl alcohol.

REFERENCES:
patent: 4891300 (1990-01-01), Ichimura et al.
patent: 4920030 (1990-04-01), Ichimura et al.

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