Photocurable composition based on acid functional primary resino

Details Photocurable composition based on acid functional primary resino Photocurable composition based on acid functional primary resino

1997-06-19

1999-07-06

Baxter, Janet

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

4302871, G03C 500

Patent

active

059196025

ABSTRACT:
Acid functional primary thiols having no hydroxy substituents in the beta position, and also having aromatic backbones, can be combined with unsaturated resins to make aqueous base-developable, photoimaging compositions such as solder masks and resists.

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