Photocopolymerizable compositions based on epoxy and hydroxyl-co

Details Photocopolymerizable compositions based on epoxy and hydroxyl-co Photocopolymerizable compositions based on epoxy and hydroxyl-co

1975-09-02

1981-03-17

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

20415918, 20415923, 430270, 430914, 430921, 430925, G03C 168

Patent

active

042568285

ABSTRACT:
Photocopolymerizable compositions are described which contain epoxides, organic material with hydroxyl functionality, and a photosensitive aromatic sulfonium or iodonium salt of a halogen-containing complex ion. Coated substrates are also described.

REFERENCES:
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patent: 3567453 (1971-03-01), Borden
patent: 3711390 (1973-01-01), Feinberg
patent: 3729313 (1973-04-01), Smith
patent: 3816280 (1974-06-01), Watt
patent: 3816281 (1974-06-01), Feinberg
patent: 3826650 (1974-07-01), Schlesinger
patent: 4026705 (1977-05-01), Crivello et al.
patent: 4058401 (1977-11-01), Crivello
patent: 4108747 (1978-08-01), Crivello
patent: 4175972 (1979-11-01), Crivello
patent: 4175973 (1979-11-01), Crivello
Irving et al., J. Chem. Soc. (1960) pp. 2078-2081.
Kennedy, Cationic Polymerization of Olefins, pp. 29-30.

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