Photochemical semiconductor etching

Details Photochemical semiconductor etching Photochemical semiconductor etching

1988-06-01

1989-08-29

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156643, 156654, 156662, 252 791, 252 792, 252 795, H01L 21306, B44C 122

Patent

active

048614211

ABSTRACT:
Laser (12) assisted photochemical etching of Hg.sub.1-x Cd.sub.x Te-type compounds (30) in solutions of bromine and other oxidants.

REFERENCES:
patent: 4310583 (1982-01-01), Baker et al.
patent: 4518456 (1985-05-01), Bjorkholm
Rothschild et al, Laser Photosublimation . . . 2 J. Mat. Res 244 (1987), p. 247.
Arnone et al, Laser Etching . . . 48 Appl. Phys. Lett. 736 (1986).
Donohue, Etching of Metal . . . (Gutfiled et al Eds., 1985 MRS, Pittsburgh, pp. 139-141.
Podlesnik et al, Waveguiding Effects . . . 48 Appl. Phys. Lett, pp. 496, (1986).
Brewer et al, Excimer Laser . . . 49 Appl. Phys. Lett 803 (1986).

Affiliated with

Also associated with

Rating

Photochemical semiconductor etching does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photochemical semiconductor etching, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photochemical semiconductor etching will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2235934