Photochemical patterning

Details Photochemical patterning Photochemical patterning

1985-04-10

1986-09-16

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

118728, 156646, 156656, 156657, 1566591, 156662, 156668, 156345, 204298, 20419235, 427 38, 427 531, 427 70, B44C 122, C03C 1500, C23F 102, B29C 1708

Patent

active

046120858

ABSTRACT:
Formation of a plasma etch mask on a film on a substrate by photodecomposition of a gas at selective portions of the film's surface to deposit etch mask material and form the etch mask is disclosed. The photodecomposition by blanket illumination through a photomask and by direct write with a computer controlled laser are both disclosed. The formation of the etch mask can be immediately followed by the plasma etch without breaking vacuum.

REFERENCES:
patent: 2841477 (1958-07-01), Hall
patent: 3113896 (1963-12-01), Mann
patent: 3122463 (1964-02-01), Ligenza et al.
patent: 3364087 (1968-01-01), Solomon et al.

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