Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Reexamination Certificate
2006-08-24
2010-02-02
Huff, Mark F (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
C430S313000, C430S322000, C430S323000
Reexamination Certificate
active
07655383
ABSTRACT:
The present invention relates to a photochemical method for manufacturing nanometrically surface-decorated substrates, i.e. the creation of periodic and aperiodic patterns of highly ordered inorganic nanostructures on a substrate. This method is based on the selective photochemical modification of a self-assembled monolayer of metal compound loaded polymer core-shell systems on widely variable substrates. Light exposure through an appropriate mask causes selective chemical modification of the polymer core shell system. By subsequently placing the substrate in an appropriate chemical solution that eradicates the non-modified polymer, the pattern given by the used mask is reproduced on the surface. Finally, the remaining organic matrix is removed and metal salt is transformed to the single metal or metal oxide nanodots by means of gas plasma treatment.
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patent: 6013855 (2000-01-01), McPherson et al.
patent: 19747816 (1995-05-01), None
patent: WO9921652 (1999-05-01), None
European Search Report, Application No. EP 05 01 9237, mailed Jul. 3, 2006.
Spatz et al.; “Micro-Nanostructured Interfaces Fabricated by the Use of Inorganic Block Copolymer Micellar Monolayers as Negative Resist for Electron-Bean Lithography”;Advanced Functional Materials; vol. 13, No. 7, Jul. 2003; pp. 569-575.
Spatz et al.; “Block Copolymer Micelle Nanolithography”;Nanotechnology; Vo. 14; Sep. 2003; pp. 1153-1160.
Gorzolnik Blazej
Mela Petra
Möller Martin
Ott Marcell
Spatz Joachim
DWI an der RWTH
Huff Mark F
Renner Otto Boisselle & Sklar
Sullivan Caleen O
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