Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-03-08
2005-03-08
Hamilton, Cynthia (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S286100, C430S287100, C430S138000, C430S281100, C430S292000, C430S306000, C430S944000
Reexamination Certificate
active
06864039
ABSTRACT:
A photosensitive printing element comprising a support; and a photopolymerizable layer comprising a photopolymerizable composition comprising at least one elastomeric binder, at least one monomer, an initiator having sensitivity to actinic radiation, and at least one photobleachable compound having sensitivity to actinic radiation; is described. Preferred photobleachable compounds are unsubstituted or substituted naphthylvinyl pyridines; unsubstituted or substituted styrylquinolines; diphenyl maleic anhydride; isomers of any of the foregoing; derivatives of any of the foregoing; and any combination of the foregoing. Such photosensitive printing elements are used to prepare flexographic printing plates and are useful in enhancing resolution and differentiating image areas from non-image areas in images produced therefrom by reducing the deleterious effect of scattered light.
REFERENCES:
patent: 3996215 (1976-12-01), Kobayashi
patent: 4251619 (1981-02-01), Kurita
patent: 4394437 (1983-07-01), Bergendahl
patent: 4427759 (1984-01-01), Gruetzmacher et al.
patent: 4455368 (1984-06-01), Kojima et al.
patent: 4460675 (1984-07-01), Gruetzmacher
patent: 4578344 (1986-03-01), Griffing
patent: 4661433 (1987-04-01), Davis
patent: 4705729 (1987-11-01), Sheats
patent: 4889795 (1989-12-01), Kaifu
patent: 5015556 (1991-05-01), Martens
patent: 5039592 (1991-08-01), Umeda
patent: 5049478 (1991-09-01), Koch
patent: 5091280 (1992-02-01), Yamaguchi et al.
patent: 5153105 (1992-10-01), Sher
patent: 5506086 (1996-04-01), Van Zoeren
patent: 5719009 (1998-02-01), Fan
patent: 0084851 (1993-07-01), None
patent: 0225676 (1994-07-01), None
patent: 62287234 (1987-12-01), None
patent: 63121039 (1988-05-01), None
Dupont Cyrel Now flexographic plates, copyright 200 E.I. duPont de Nemours and COmpany, three pages from http://www.cyrel.dupont.com site on internet.*
Galiazzo, Guido, et al., Synthesis, Electronic Spectra, and Photoisomerization of Naphthylpyridylethylenes,J.C.S. Perkin II, 1712-1715, 1975.
Galiazzo, Guido, et al., Synthesis and Photochemical Behaviour of N-Styryolquinolines and N-Styrylisoquinolines,Gazzetta Chimica Italiana, 120, 581-585, 1990.
Stegrist, A. E., et al., Preparation of Styryl Derivatives From Methyl-Substituted Carbocyclic Aromatics,Helvetica Chimica Acta, 52, Part 8, 2521-2554, 1969.
Shaw, B. D., et al., The Reaction Between 2-Picoline and Aromatic Aldehydes,J. Chem. Soc., 77-79, 1933.
Cozzari, C., et al., Synthesis of a Naphthylvinylpyridine Derivative and its use for Affinity Chromatography of Choline Acetyltransferase,Analytical Biochemistry, 133, 120-125, 1983.
West, Paul R., et al., Contrast Enhancement—A Route to Submicron Optical Lithography,Proceedings SPIE, 394, 33-38, 1983.
Borden, Douglas G., et al., Photopolymer Design: Photocrosslinkable Styrylpyridinium Substituted Vinyl Polymers With Absorption Maxima From 270 NM to 540 NM,Makromol Chem., 178, 3035-3049, 1977.
Hamer, J., et al., Nitrones,Chem. Reviews, 64, No. 4, 473-495, 1964.
Loader, C. E., et al., Studies in Photochemistry. Part VI. The Photocyclodehydrogenation of Some Styrylquinolines and Styrylisoquinolines,J. Chem. Soc., C, 330-333, 1968.
Yonezawa, T., et al., Water-Soluble Contrast Enhancing Materials—New Photobleachable Dyes,Polymer Engineering and Science, 29, No. 14, 898-901, 1989.
Mitchell, Earl N., Photographic Science,John Wiley & Sons, 168-169, 1984.
Strom, Don R., Optical Lithography and Contrast Enhancement,Semiconductor International, May 1986.
Griffing, B. F., et al., Contrast Enhanced Photoresists—Processing and Modeling,Polymer Engineering and Science, 23, No. 17, 947-952, 1983.
Ichimura, K., Photochromic Materials and Photoresists,Photochromism, 903-918, 1990.
XP002162199, Nippon Paint Co. Ltd., Dec. 14, 1987.
Umeda, 110: 145011, CA, ACS copyright, English Abstract of JP62-287234, 2 pages.
Umeda, JP62-287234A, Copyright JPU & Japio, 1987, English Abstract of JP62-287234, 2 pages.
Umeda, 1988-025851, Derwent Information Ltd., Copyright 1999, English Abstract of JP62-287234, 3 pages.
Cheng Lap Kin
Cheng Lap-Tak Andrew
E.I. du Pont de Nemours and Company
Hamilton Cynthia
LandOfFree
Photobleachable compounds for use in flexographic printing... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photobleachable compounds for use in flexographic printing..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photobleachable compounds for use in flexographic printing... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3398014