Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-02-15
2005-02-15
Walke, Amanda (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S325000, C430S913000, C430S914000, C430S921000, C430S922000, C568S019000, C568S027000, C568S028000
Reexamination Certificate
active
06855476
ABSTRACT:
A photoacid compound having the following general structure:in-line-formulae description="In-line Formulae" end="lead"?R—O(CF2)nSO3Xin-line-formulae description="In-line Formulae" end="tail"?wherein n is an integer between about 1 to 4; R is selected from the group consisting of: substituted or unsubstituted C1-C12linear or branched alkyl or alkenyl, substituted or unsubstituted araalkyl, substituted or unsubstituted aryl, substituted or unsubstituted bicycloalkyl, substituted or unsubstituted tricycloalkyl, hydrogen, alkyl sulfonic acid, substituted or unsubstituted perfluoroalkyl, the general structure F((CF2)pO)m(CF2)q— wherein p is between about 1 to 4, m is between about 0 to 3 and q is between about 1 to 4, and substituted or unsubstituted partially fluorinated alkyl, halofluoroalkyl, perfluoroalkylsulfonic, or glycidyl; and X is selected from the group consisting of: organic cations and covalently bonded organic radicals.
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English language abstract of DE 295241.*
Caplus Abstract Document No. 108:5551 “A Novel Method for Carbon-Carbon Bond Formation . . . ” Chen et al.
Caplus Abstract Document No. 100:102711 “Perfluroro and Polyfluorosulfonic Acids . . . ” Su et al.
Caplus Abstract Document No. 101:22953 “Reaction of 2,2,3,3-Tetrafluoropropyl . . . ” Li et al.
Caplus Abstract Document No. 132:194543 “Some New Reactions of Poly(Per)Fluoroalkanesulfonyl . . . ” Tian et al.
Blakeney Andrew J.
Dimov Ognian
Ferreira Lawrence
Hatfield John P.
Kocab J. Thomas
Arch Specialty Chemicals, Inc.
Ohlandt Greeley Ruggiero & Perle
Walke Amanda
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