Photoacid generators and photoresists comprising same

Details Photoacid generators and photoresists comprising same Photoacid generators and photoresists comprising same

2005-02-01

2005-02-01

Thornton, Yvette C. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S018000, C430S914000, C430S921000, C562S113000

Reexamination Certificate

active

06849374

ABSTRACT:
This invention relates to new photoacid generator compounds and photoresist compositions that comprise such compounds. In particular, the invention relates to photoacid generator compounds that generate an α,α-difluoroalkyl sulfonic acid upon exposure to activating radiation. Positive- and negative-acting chemically amplified resists that contain such PAGs are particularly preferred. The invention also includes methods for synthesis of such PAGs and α,α-difluoroalkyl sulfonic acids.

REFERENCES:
patent: 5296332 (1994-03-01), Sachdev et al.
patent: 6280911 (2001-08-01), Trefonas, III
patent: 6358665 (2002-03-01), Pawlowski et al.
patent: 295 421 (1991-10-01), None
patent: 0 693 468 (1996-01-01), None
patent: 1 033 624 (2000-09-01), None
patent: 1199603 (2002-04-01), None

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