Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2007-12-04
2007-12-04
Walke, Amanda C. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S280100, C430S286100, C430S905000, C430S913000, C430S914000, C430S311000
Reexamination Certificate
active
10375773
ABSTRACT:
The invention provides a high-resolution resist material comprising an acid generator that has high sensitivity and high resolution with respect to high-energy rays of 300 nm or less, has small line-edge roughness, and is superior in heat stability and in shelf stability, and provides a pattern forming method that uses this resist material. The invention further provides a chemically amplified positive resist material comprising a base resin, an acid generator and a solvent in which the acid generator generates an alkylimidic acid containing a fluorine group, and provides a pattern forming method comprising a step of applying the resist material to the substrate, a step of performing exposure to a high-energy ray of a wavelength of 300 nm or less through a photomask following heat treatment, and a step of performing development by a developing solution following heat treatment.
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Japanese Office Action for corresponding Japanese patent application No. 2002-369145; date of mailing Apr. 20, 2007.
English translation of Japanese Office Action for corresponding Japanese patent application No. 2002-369145; date of mailing Apr. 20, 2007.
Hatakeyama Jun
Kobayashi Tomohiro
Ohsawa Youichi
Myers Bigel Sibley & Sajovec P.A.
Shin-Etsu Chemical Co. , Ltd.
Walke Amanda C.
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