Photo reticles using channel assist features

Details Photo reticles using channel assist features Photo reticles using channel assist features

2005-11-22

2005-11-22

Lin, Sun James (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000

Reexamination Certificate

active

06968528

ABSTRACT:
Photo reticles (110) are formed comprising a first and second printable features (130), (140) which are connected by a channel assist feature (150). The size of the channel assist feature is such that the channel assist feature will not substantially print on photoresist that is exposed using the reticle. Third printable features (120) can be placed a distance WDfrom the channel assist feature (150). The channel assist feature will assist in the formation of the third printable feature (120).

REFERENCES:
patent: 2004/0170905 (2004-09-01), Liebmann et al.

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