Photo-resist material structure and method of producing the...

Details Photo-resist material structure and method of producing the... Photo-resist material structure and method of producing the...

2007-07-04

2010-10-26

Walke, Amanda C. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S311000, C430S312000, C430S330000, C430S331000, C430S394000

Reexamination Certificate

active

07820358

ABSTRACT:
An apparatus includes a substrate and a photoresist material structure arranged adjacent to the substrate so that a cavity is formed between the substrate and the photoresist material structure. The cavity has an opening. The photoresist material structure includes a frame portion disposed on a main side of the substrate and a cap portion spanning over a part of the main side of the substrate at a distance to the main side. The cap portion is formed in the first photoresist layer and the frame portion is formed in the second photoresist layer.

REFERENCES:
patent: 6582890 (2003-06-01), Dentinger et al.
patent: 7129025 (2006-10-01), Tseng et al.
patent: 7229745 (2007-06-01), Lamarre
patent: 2005/0277064 (2005-12-01), Lamarre

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