Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2006-10-31
2006-10-31
Lee, Sin (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S284100, C430S285100, C430S286100, C430S287100, C430S916000, C430S905000, C430S910000, C430S911000, C430S311000, C430S325000, C430S319000
Reexamination Certificate
active
07129022
ABSTRACT:
This invention relates to a photo-polymerization type photosensitive electrode paste composition for a plasma display panel that is capable of preventing a bubble from occurring on an electrode surface during an electrode paste printing process and a damage of an electrode pattern caused by adhesive strength reduction, and a method of fabricating the electrode using the same.A photo-polymerization type photo-sensitive electrode paste composition for a PDP according to the present invention includes a binder polymer for increasing viscosity; at least one of a multi-functional monomer and a multi-functional oligomer that are combined in the shape of chain in reaction to a radical; metal powder; a frit glass for gluing the metal powder; and a photo-initiator and solvent for generating the radical in reaction to a light.
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Machine-assisted English translation for JP 2002-105112, provided by Japan Patent Office.
Kim Sang Tae
Park Jong Woo
Park Lee Soon
Park Seung Tae
Fleshner & Kim LLP
Lee Sin
LG Electronics Inc.
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