Photo polymerization initiator compositions having high sensitiv

Details Photo polymerization initiator compositions having high sensitiv Photo polymerization initiator compositions having high sensitiv

1983-09-07

1984-10-02

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

20415918, 20415922, 20415923, 430913, 430916, 430921, 430922, 502159, 502160, G03C 168

Patent

active

044748680

ABSTRACT:
A photo polymerization initiator composition is disclosed. The composition is comprised of an organic peroxide and a salt selected from the group consisting of pyrylium salts, thiapyrylium salts and selenopyrylium salts represented by the general formula (I): ##STR1## the substituents are defined within the specification. By utilizing the disclosed photo polymerization initiator composition, it is possible to obtain high sensitivity even in the visible range of light.

REFERENCES:
patent: 3926643 (1975-12-01), Chang
patent: 4175263 (1979-12-01), Priddy
patent: 4271260 (1981-06-01), Abele et al.

Affiliated with

Also associated with

Rating

Photo polymerization initiator compositions having high sensitiv does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photo polymerization initiator compositions having high sensitiv, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photo polymerization initiator compositions having high sensitiv will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-527055