Photo-patternable mono-phase fluorinated organometallic...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C430S270160, C430S281100, C430S198000, C430S322000, C430S325000, C430S328000, C528S010000, C522S148000, C427S162000

Reexamination Certificate

active

06908723

ABSTRACT:
A photo-patternable perfluorinated silane sol-gel material is presented that exhibits a high refractive index and propagation losses below 1 dB/cm at the telecommunication wavelengths. The sol-gels are produced with general formula [img id="CUSTOM-CHARACTER-00001" he="3.13mm" wi="2.79mm" file="US06908723-20050621-P00900.TIF" alt="custom character" img-content="character" img-format="tif" ?(CH2)n,R′—Si(O)2]x—[Si(O)4]y—[R′—Si(O)3]z—[R″(CH2)n—M(O)3]w—[R′″(CH2)n—Si(O)3]vwhere O is oxygen, Si is silicon, M is a metal alkoxyde known to form bonds with organic compounds through oxygen donor ligands, and whereimg id="CUSTOM-CHARACTER-00002" he="3.13mm" wi="2.79mm" file="US06908723-20050621-P00900.TIF" alt="custom character" img-content="character" img-format="tif" ?, R″ and R′″ are photo cross-linkable groups, and where (CH2)nare alkyl spacers with n being an integer ≧0. The sol-gels can be fabricated to produce complex waveguide structures directly onto silica-on-silicon substrates with low bending losses.

REFERENCES:
patent: 4814017 (1989-03-01), Yoldas et al.
patent: 5100764 (1992-03-01), Paulson et al.
patent: 5840111 (1998-11-01), Wiederhuft et al.
R. Buestrich et al., ORMOCER's for Optical Interconnection Technology, Journal of Sol-Gel Science and Technology 20, 2001, pp. 181-186, Kluwer Academic Publishers, The Netherlands.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Photo-patternable mono-phase fluorinated organometallic... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photo-patternable mono-phase fluorinated organometallic..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photo-patternable mono-phase fluorinated organometallic... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3478868

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.