Photo mask capable of improving resolution by utilizing...

Details Photo mask capable of improving resolution by utilizing... Photo mask capable of improving resolution by utilizing...

2004-09-16

2008-10-07

Rosasco, Stephen (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07432022

ABSTRACT:
A photo mask enhances the resolution of a photolithography process by polarizing the exposure light. The photo mask includes a transparent substrate made of quartz, a reflection pattern disposed on the transparent substrate, and a light-blocking pattern disposed on the reflection pattern. The external reflection pattern defines a light-transmitting area by exposing portions of the transparent substrate. The light-blocking pattern has the same size and shape as the external reflection pattern.

REFERENCES:
patent: 5686209 (1997-11-01), Iwamatsu et al.
patent: 6163367 (2000-12-01), Obszarny
patent: 7090948 (2006-08-01), Rau
patent: 2002/0195271 (2002-12-01), Gailus
patent: 2006/0099517 (2006-05-01), Sugawara
patent: 1999-0028757 (1999-07-01), None

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