Phosphonium salts and processes for production of and uses for t

Chemistry of hydrocarbon compounds – Unsaturated compound synthesis – By addition of entire unsaturated molecules – e.g.,...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

585600, 585601, 560261, C07C 218

Patent

active

049926098

ABSTRACT:
Novel phosphonium salts of the general formula ##STR1## wherein R.sup.1 and R.sup.2 each is a hydrogen atom or a hydrocarbon group of 1 to 12 carbon atoms which may optionally be substituted; R.sup.3 is a hydrogen atom or a hydrocarbon group of 1 to 5 carbon atoms which may optionally be substituted; R.sup.4, R.sup.5 and R.sup.6 each is a hydrocarbon group of 1 to 8 carbon atoms which may optionally be substituted; X is a hydroxyl group, a hydroxycarbonyloxy group or a lower alkylcarbonyloxy group, and processes for production of the salts are described. Telomerization catalysts containing said phosphonium salts and processes for production of straight-chain alkadienyl compounds using the same catalysts are also provided.

REFERENCES:
patent: 3792101 (1974-02-01), Hattori et al.
patent: 3823199 (1974-07-01), Wright
patent: 4367305 (1981-03-01), Yoshimura et al.
patent: 4417079 (1982-02-01), Yoshimura et al.
Yamamoto et al., Organometallics, "Interaction of Palladium (O) Complexes with Allylic Acetates, Allyl Ethers, . . . ", V.5, 1559-1567, 1986.
CA., vol. 54; 22362, 1960.
CA., vol 58; 91206, 1963.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Phosphonium salts and processes for production of and uses for t does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Phosphonium salts and processes for production of and uses for t, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Phosphonium salts and processes for production of and uses for t will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-21808

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.