Phobic barrier meniscus separation and containment

Drying and gas or vapor contact with solids – Process – With nondrying treating of material

Reexamination Certificate

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Details

C034S079000

Reexamination Certificate

active

06988326

ABSTRACT:
In one of the many embodiments, a method for processing a substrate is provided which includes generating a first fluid meniscus and a second fluid meniscus on a surface of the substrate where the first fluid meniscus being substantially adjacent to the second fluid meniscus. The meniscus also includes substantially separating the first fluid meniscus and the second fluid meniscus with a barrier.

REFERENCES:
patent: 3953265 (1976-04-01), Hood
patent: 5343234 (1994-08-01), Kuehnle
patent: 5807522 (1998-09-01), Brown et al.
patent: 6364449 (2002-04-01), Takahashi et al.
patent: 6610189 (2003-08-01), Wang et al.

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