Phenylacetates and their use in radiation sensitive compositions

Details Phenylacetates and their use in radiation sensitive compositions Phenylacetates and their use in radiation sensitive compositions

1994-10-14

1995-12-19

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430170, 430176, G03F 7004

Patent

active

054767512

ABSTRACT:
The invention relates to compounds of formula I ##STR1## wherein A is a radical of formula ##STR2## R.sub.1 and R.sub.2 are each independently of the other hydrogen, C.sub.1 --C.sub.4 alkyl, C.sub.1 C.sub.4 alkoxy, halogen or a radical of formula ##STR3## wherein X is --O--, --CH.sub.2 --, --C(CH.sub.3).sub.2 -- or --SO.sub.2 --, and R.sub.3 and R.sub.4 are each independently of the other hydrogen, C.sub.1 --C.sub.4 alkyl or phenyl, as well as compositions comprising these compounds.
The compositions are particularly suitable for making integrated circuits.

REFERENCES:
patent: 4888048 (1989-12-01), Stroech et al.
patent: 5034305 (1991-07-01), Nguyen-Kim et al.
patent: 5035979 (1991-07-01), Nguyen-Kim et al.
J. Kosar, "Light Sensitive Systems," John Wiley & Sons, N.Y. 1965 pp. 339-352.
J. Org. Chem. vol. 43, No. 18, 1978 pp. 3548-3552.
Stroech, et al., CA 110(25): 231,643t (1989) Abst. of DE 3,722,133.

Affiliated with

Also associated with

Rating

Phenylacetates and their use in radiation sensitive compositions does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Phenylacetates and their use in radiation sensitive compositions, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Phenylacetates and their use in radiation sensitive compositions will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-991361