Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Finishing or perfecting composition or product
Patent
1987-07-27
1989-07-25
Michl, Paul R.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Finishing or perfecting composition or product
430302, 430309, G03C 524
Patent
active
048513245
ABSTRACT:
A developer composition having a pH in the range of from about 6.5 to about 7.5 comprising in admixture:
REFERENCES:
patent: 4147545 (1979-04-01), Rowe et al.
patent: 4271261 (1981-06-01), Shimizu et al.
patent: 4308340 (1981-12-01), Walls
patent: 4780396 (1987-02-01), Hsieh
Chemical Abstracts, vol. 91, 1979, 91:220356q.
Buscher Mark R.
Hoechst Celanese Corporation
Michl Paul R.
LandOfFree
Phenoxy propanol containing developer compositions for lithograp does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Phenoxy propanol containing developer compositions for lithograp, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Phenoxy propanol containing developer compositions for lithograp will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2357844