Phase shifting photomask and a method of fabricating thereof

Details Phase shifting photomask and a method of fabricating thereof Phase shifting photomask and a method of fabricating thereof

2007-08-14

2009-12-22

Rosasco, Stephen (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07635546

ABSTRACT:
A phase shifting photomask comprising a patterned film stack formed on a transparent substrate and a method of fabricating the photomask are disclosed. In one embodiment, the film stack includes a first layer having a pre-determined value of transparency to light of an illumination source of a lithographic system and a second layer that is substantially transparent to the light and facilitates in the light a pre-determined phase shift.

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Notice to File a Response from the Korean Intellectual Property Office dated Dec. 13, 2008. A Concise Statement of Relevance is provided.
Notice of Final Rejection from the Korean Intellectual Property Office dated May 26, 2009, for corresponding Korean Patent Application No. 10-2007-0084282. A Concise Statement of Relevance is provided.

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