Phase shifting mask and method of manufacturing same

Details Phase shifting mask and method of manufacturing same Phase shifting mask and method of manufacturing same

1992-04-27

1993-11-09

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430 22, 430269, 430311, G03F 900

Patent

active

052601528

ABSTRACT:
A method for manufacture of such a phase shifting mask comprises the steps of forming a light shielding layer on a substrate; forming a photoresist on the light shielding layer; patterning the photoresist to form a resist pattern; providing an opening in the light shielding layer by the use of the resist pattern as a mask, thereby forming a light shielding pattern; etching the substrate anisotropically to form a phase shifting segment; side etching the light shielding pattern to form a light shielding region; and removing the resist pattern.

REFERENCES:
patent: 5045417 (1991-09-01), Okamoto

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