Phase shift photomask performance assurance method

Details Phase shift photomask performance assurance method Phase shift photomask performance assurance method

2005-07-30

2011-11-01

Rosasco, Stephen (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S311000

Reexamination Certificate

active

08048589

ABSTRACT:
A method for inspecting a phase shift photomask employs a phase shift photomask having an active pattern region. An optical property of the phase shift photomask is measured within the active pattern region, rather than, for example, a non-active pattern border region. By making the measurement within the active pattern region, performance of the phase shift mask may be properly assured. The method is particularly useful for inspecting attenuated phase shift photomasks to assure absence of side-lobes when photoexposing blanket photoresist layers.

REFERENCES:
patent: 5783337 (1998-07-01), Tzu et al.
patent: 7250309 (2007-07-01), Mak et al.
patent: 2002/0025480 (2002-02-01), Itoh et al.
patent: 2002/0150824 (2002-10-01), Park
patent: 2004/0086788 (2004-05-01), Shiota et al.
patent: 2004/0229137 (2004-11-01), Takushima
patent: 2005/0053850 (2005-03-01), Askebjer et al.
patent: 2005/0095510 (2005-05-01), Yamamoto et al.
patent: 2005/0112474 (2005-05-01), Sandstrom
patent: 2006/0099519 (2006-05-01), Moriarty et al.
patent: 2006/0134529 (2006-06-01), Hansen

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