Phase shift masks including chromium oxide and alumina phase shi

Details Phase shift masks including chromium oxide and alumina phase shi Phase shift masks including chromium oxide and alumina phase shi

1997-06-25

1998-12-22

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

428210, G02F 900

Patent

active

058517065

ABSTRACT:
A half tone phase shift mask includes a substrate which is transparent with respect to exposure radiation and a phase shifter pattern on the substrate. The phase shifter pattern comprises chromium oxide (Cr.sub.2 O.sub.3) and alumina (Al.sub.2 O.sub.3). Fine patterns can therefore be formed using phase shift masking of exposure radiation having a 193 nm wavelength, such as light from an ArF excimer laser.

REFERENCES:
patent: 5389474 (1995-02-01), Iguchi et al.
patent: 5536604 (1996-07-01), Ito

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