Phase shift mask and method of producing the same

Details Phase shift mask and method of producing the same Phase shift mask and method of producing the same

1998-06-19

1999-10-26

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

059725435

ABSTRACT:
A phase shift mask, e.g. a halftone phase shift mask, which need not to form an ultra-fine pattern and is capable of suppressing during exposure the occurrence of a sub-peak of light intensity, which has an adverse effect on the image formation, and which has a light-blocking pattern with a reduced transmittance at a region outside a device pattern area which corresponds to a region subjected to multiple exposure during transfer effected by using the mask. The halftone phase shift mask has on a transparent substrate (101) a halftone phase shift film (102) comprising a single layer or a plurality of layers. The composition of the halftone phase shift film (102) is changed in a region (107) outside a device pattern area on the transparent substrate (101) which corresponds to a multiple-exposure region by a method wherein the region (107) is irradiated with an electromagnetic wave, a particle beam, heat rays, etc., or a method wherein after a region in which the composition is not desired to change has been masked, the whole blank is exposed to an active atmosphere, thereby reducing the transmittance for exposure light at the region (107).

REFERENCES:
patent: 5424153 (1995-06-01), Asai
patent: 5429896 (1995-07-01), Hasegawa et al.
patent: 5527647 (1996-06-01), Doi et al.

Affiliated with

Also associated with

Rating

Phase shift mask and method of producing the same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Phase shift mask and method of producing the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Phase shift mask and method of producing the same will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-761860