Phase shift mask, and exposure method and device...

Details Phase shift mask, and exposure method and device... Phase shift mask, and exposure method and device...

2005-11-22

2005-11-22

Whitmore, Stacy A. (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000, C716S030000, C430S005000

Reexamination Certificate

active

06968529

ABSTRACT:
Disclosed is a phase shift mask capable of assuring high-precision pattern transfer, an exposure method and apparatus using such phase shift mask, and a device manufacturing method using such phase shift mask. The phase shift mask includes a substrate having an engraved portion and a non-engraved portion, the engraved portion having a side wall and a bottom face, and a light blocking film provided in a portion of the bottom face and the side wall of the engraved portion. Specifically, the size to be defined by subtracting a thickness of the light blocking film at the side wall from a width of the engraved portion is made equal to 1.3 to 2.4 times the width of a light transmitting portion provided at the engraved portion.

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“SCAA Mask Exposures and Phase Phirst Design for 110nm and Below” M.D. Levenson et al., Proceedings of SPIE, 4346, (2001), pp. 817-826.

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