Phase change memory devices and methods for manufacturing...

Active solid-state devices (e.g. – transistors – solid-state diode – Integrated circuit structure with electrically isolated... – Passive components in ics

Reexamination Certificate

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C257S536000, C257SE21495, C365S046000, C365S100000

Reexamination Certificate

active

07569909

ABSTRACT:
Phase change memory devices and methods for manufacturing the same are provided. An exemplary embodiment of a phase change memory device comprises a substrate. A dielectric layer is formed over the substrate and a phase change material layer is embedded in the dielectric layer. A first conductive electrode is also embedded in the dielectric layer to penetrate the phase change material layer and extends perpendicular to a top surface of the dielectric layer.

REFERENCES:
patent: 2006/0003470 (2006-01-01), Chang
patent: 2008/0011999 (2008-01-01), Choi et al.
patent: 2008/0067486 (2008-03-01), Karpov et al.
patent: 2008/0067491 (2008-03-01), Lowrey
patent: 2008/0138929 (2008-06-01), Lung
patent: 2008/0206921 (2008-08-01), Lee
patent: 2008/0206922 (2008-08-01), Oliva et al.
patent: 2008/0251778 (2008-10-01), Chen et al.
patent: 2008/0268565 (2008-10-01), Lung
patent: 2009/0026439 (2009-01-01), Park et al.

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