Phase change memory devices and fabrication methods thereof

Semiconductor device manufacturing: process – Having selenium or tellurium elemental semiconductor component

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C438S597000, C257SE21068

Reexamination Certificate

active

07449360

ABSTRACT:
In a memory device, at least one conductive contact having a width of less than, or equal to, about 30 nm may be formed on a first electrode. A dielectric layer may be formed on the sides of the at least one conductive contact, and a phase change material film may be formed on the conductive contact. A second electrode may be formed on the phase change material.

REFERENCES:
patent: 5444005 (1995-08-01), Kim et al.
patent: 6413812 (2002-07-01), Harshfield
patent: 6545903 (2003-04-01), Wu
patent: 7259023 (2007-08-01), Kuo et al.
patent: 2005/0112896 (2005-05-01), Hamann et al.
patent: 2006/0281216 (2006-12-01), Chang et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Phase change memory devices and fabrication methods thereof does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Phase change memory devices and fabrication methods thereof, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Phase change memory devices and fabrication methods thereof will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4031367

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.