Permanent resist, permanent resist-laminated substrate and...

Details Permanent resist, permanent resist-laminated substrate and... Permanent resist, permanent resist-laminated substrate and...

2005-06-14

2005-06-14

Thornton, Yvette C. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S270100, C430S284100, C430S320000, C430S328000, C430S330000

Reexamination Certificate

active

06905810

ABSTRACT:
A permanent resist obtained by at least photoexposure and alkali development of a photosensitive resin composition, the permanent resist containing a metal carboxylate group, or a carboxyl group (a carboxyl anhydride group is also included among a carboxyl group according to the invention) and a metal carboxylate group, wherein an alkaline earth metal carboxylate group constitutes at least 30 mole percent of the total of a carboxyl group and a metal carboxylate group.

REFERENCES:
patent: 6583198 (2003-06-01), Sato et al.
patent: 6692793 (2004-02-01), Sato et al.
patent: 2002/0169226 (2002-11-01), Sato et al.
patent: 2002-162739 (2002-06-01), None

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