Perforated shield for plasma immersion ion implantation

Details Perforated shield for plasma immersion ion implantation Perforated shield for plasma immersion ion implantation

1998-06-03

2000-04-18

Dang, Thi

Coating apparatus

Gas or vapor deposition

With treating means

118723E, 156345, C23C 1600

Patent

active

060510730

ABSTRACT:
A plasma treatment system (200) for implantation with a novel susceptor with a perforated shield (201). The system (200) has a variety of elements such as a chamber in which a plasma is generated in the chamber. The system (200) also has a susceptor disposed in the chamber to support a silicon substrate, which has a surface. The perforated shield (201) draws ions from the implantation toward and through the shield to improve implant uniformity in the substrate. In a specific embodiment, the chamber has a plurality of substantially planar rf transparent windows (26) on a surface of the chamber. The system (200) also has an rf generator (66) and at least two rf sources in other embodiments.

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